Huawei has confirmed in a posting on its website reports about its breakthrough in making a light source component used in EUV lithography systems which are required for making high-end processors on ...
Canon launched its Nanoimprint Lithography semiconductor manufacturing equipment, which has the potential to compete with ASML's EUV technology currently in production at 4nm. Canon's first planned ...
TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...
ACM Research, Inc. previously announced the delivery of its first Ultra Lith BK lithography system to a leading global display panel manufacturer, featuring ultraviolet curing uniformity of ±5% and ...
Continued scaling of integrated circuits to smaller dimensions is still a viable way to increase compute power, achieve higher memory cell density, or reduce power consumption. These days, chip makers ...
MUNICH, Germany — Suss MicroTec Test Systems GmbH today announced it has extended the use of low-cost 1:1 full-field lithography tools to sub-micron production steps using a breakthrough mask ...
LEUVEN, Belgium — This week, at SPIE 2023 Advanced Lithography + Patterning Conference, in San Jose, CA, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, ...
MELVILLE, N.Y., April 8, 2021 /PRNewswire/ — Canon U.S.A., Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., has launched the FPA-5520iV LF Option for ...
Several vendors are rolling out next-generation inspection systems and software that locates problematic defects in chips caused by processes in extreme ultraviolet (EUV) lithography. Each defect ...
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