Extreme ultraviolet lithography (EUVL) has emerged as a cornerstone technology in the semiconductor industry, enabling the production of devices with sub-10 nm feature sizes. By utilising a 13.5 nm ...
Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...
A new ultraviolet laser source pushes maskless lithography closer to mainstream use in advanced semiconductor packaging by ...
New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...
Building an integrated circuit (IC) requires various physical and chemical processes to be performed on a semiconductor (e.g., silicon) substrate. Millions of transistors can be fabricated and wired ...
Scientists developed a two-photon-enhanced metasurface that cuts photon requirements for nanoscale displacement measurement ...
SPIE, the international society for optics and photonics, awarded their Gold Medal to Maryellen Giger (pictured here with her team) for pioneering work in computer-aided diagnosis and image ...
Few would expect the future of artificial intelligence (AI) to depend on Eindhoven, a quiet Dutch town. Yet just beyond its borders sits the headquarters of ASML, the only company that makes the ...
Researchers review AI-powered inverse lithography, showing how deep learning boosts chip patterning precision and efficiency while facing scaling challenges. Computational lithography optimizes the ...
Nuvoton Technology Corporation Japan (hereinafter "NTCJ") announced on January 20 the start of mass production of its high-power ultraviolet semiconductor laser (379 nm, 1.0 W), which delivers ...
The 22 award recipients represent wide range of stellar achievements across light-based technologies. For pioneering work in ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results