Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

To help designers find complex features with a design implementation, physical verification and DFM tools may employ pattern matching techniques. That is, a designer can simply copy a particular ...

As the complexity of IC designs continues to grow, moving critical checks earlier in the design cycle helps designers identify and resolve issues before they escalate, streamlining the overall ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

In analog layout design, precise layout matching techniques are crucial to ensure the accuracy and performance of the circuit so that transistors exhibit similar electrical properties (i.e.